| 1 2 3 4 5 6 7 8 9 10 |
| Patent ID | Title | Date Filed |
| 7181707 | Method of setting process parameter and method of setting process parameter and/or design rule
| March 12, 2003 |
| 7178128 | Alternating phase shift mask design conflict resolution
| October 15, 2002 |
| 7178127 | Method for time-evolving rectilinear contours representing photo masks
| August 22, 2005 |
| 7175952 | Method of generating mask distortion data, exposure method and method of producing semiconductor device
| May 19, 2004 |
| 7175940 | Method of two dimensional feature model calibration and optimization
| October 9, 2002 |
| 7174532 | Method of making a semiconductor device by balancing shallow trench isolation stress and optical proximity effects
| November 18, 2004 |
| 7174531 | Creating photolithographic masks
| March 26, 2004 |
| 7171645 | Semiconductor device, method of generating pattern for semiconductor device, method of manufacturing semiconductor device and device of generating pattern used for semiconductor device
| August 6, 2003 |
| 7171637 | Translation generation for a mask pattern
| January 14, 2005 |
| 7169515 | Phase conflict resolution for photolithographic masks
| April 29, 2004 |
| 7167811 | Methods and apparatus for data analysis
| February 14, 2003 |
| 7167768 | Board work system having provision for establishing operating environment suitable for operator, and process of establishing the suitable operating environment
| July 29, 2002 |
| 7165235 | Exposure pattern forming method and exposure pattern
| April 8, 2005 |
| 7165233 | Test ket layout for precisely monitoring 3-foil lens aberration effects
| April 12, 2004 |
| 7159205 | Use of non-lithographic shrink techniques for fabrication/making of imprints masks
| May 4, 2004 |
| 7159197 | Shape-based geometry engine to perform smoothing and other layout beautification operations
| December 31, 2001 |
| 7155699 | Streamlined IC mask layout optical and process correction through correction reuse
| May 7, 2004 |
| 7155698 | Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
| November 17, 2003 |
| 7155689 | Design-manufacturing interface via a unified model
| October 7, 2003 |
| 7152219 | Reference image generation from subject image for photolithography mask analysis
| December 10, 2002 |
| 7149999 | Method for correcting a mask design layout
| February 25, 2004 |
| 7149998 | Lithography process modeling of asymmetric patterns
| December 30, 2002 |
| 7147976 | Binary OPC for assist feature layout optimization
| October 17, 2005 |
| 7146599 | Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
| April 15, 2004 |
| 7146597 | CAD method for arranging via-holes, a CAD tool, photomasks produced by the CAD method, a semiconductor integrated circuit manufactured with photomasks and a computer program product for executing the CAD method
| September 27, 2004 |
| 7143389 | Systems and methods for generating node level bypass capacitor models
| July 28, 2004 |
| 7143329 | FPGA configuration memory with built-in error correction mechanism
| March 9, 2004 |
| 7139998 | Photomask designing method, pattern predicting method and computer program product
| September 30, 2003 |
| 7139997 | Method and system for checking operation of a mask generation algorithm
| May 11, 2004 |
| 7139996 | Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device
| December 19, 2002 |
| 7137098 | Pattern component analysis and manipulation
| August 27, 2004 |
| 7137096 | Interconnect structure of a chip and a configuration method thereof
| March 10, 2004 |
| 7137092 | Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure
| August 10, 2004 |
| 7132203 | Phase shift masking for complex patterns with proximity adjustments
| April 6, 2004 |
| 7131106 | Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method
| November 7, 2003 |
| 7131105 | System and method for automatic mesh generation from a system-level MEMS design
| September 19, 2003 |
| 7131104 | Fast and accurate optical proximity correction engine for incorporating long range flare effects
| May 13, 2004 |
| 7131103 | Conductor stack shifting
| March 4, 2004 |
| 7131102 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
| February 19, 2004 |
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