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Your search returned 3406 patents.
( 430/5 in Current US Classification ) |
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| Patent ID | Title | Date Filed |
| 7205076 | Mask for laser irradiation and apparatus for laser crystallization using the same
| November 13, 2003 |
| 7205075 | Method of forming a vertical memory device with a rectangular trench
| May 29, 2003 |
| 7205074 | Venting of pellicle cavity for a mask
| December 31, 2002 |
| 7200835 | Method of locating sub-resolution assist feature(s)
| January 25, 2006 |
| 7198872 | Light scattering EUVL mask
| May 25, 2004 |
| 7197108 | Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask
| July 28, 2003 |
| 7195846 | Methods of manufacturing photomask blank and photomask
| December 2, 2003 |
| 7195845 | Spin-coating method, determination method for spin-coating condition and mask blank
| April 3, 2003 |
| 7193684 | Projection exposure mask, projection exposure apparatus, and projection exposure method
| January 13, 2006 |
| 7193240 | Sequential lateral solidification mask with stripe-shaped portions for transmitting laser light
| March 31, 2004 |
| 7190438 | Near-field exposure apparatus and near-field exposure photomask
| February 18, 2004 |
| 7189495 | Method of forming photoresist pattern free from side-lobe phenomenon
| May 29, 2003 |
| 7189480 | Mask used for layer formation and process of making the mask
| January 5, 2004 |
| 7189479 | Phototool coating
| August 21, 2003 |
| 7186481 | Flare measuring mask and flare measuring method of semiconductor aligner
| January 22, 2004 |
| 7186480 | Method for adjusting dimensions of photomask features
| December 10, 2003 |
| 7185009 | IC foundry manufacturing technology master data management structure
| March 31, 2003 |
| 7183025 | Phase difference specifying method
| May 30, 2006 |
| 7183022 | Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane
| May 15, 2003 |
| 7179570 | Chromeless phase shift lithography (CPL) masks having features to pattern large area line/space geometries
| December 2, 2005 |
| 7179569 | Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same
| July 9, 2004 |
| 7179568 | Defect inspection of extreme ultraviolet lithography masks and the like
| July 10, 2003 |
| 7179567 | Phase shift mask blank, phase shift mask, and method of manufacture
| June 27, 2003 |
| 7179545 | Halftone phase shift mask blank, and method of manufacture
| October 7, 2003 |
| 7175952 | Method of generating mask distortion data, exposure method and method of producing semiconductor device
| May 19, 2004 |
| 7175947 | Light reflective structure, method for producing the same and display
| May 15, 2003 |
| 7175945 | Focus masking structures, focus patterns and measurements thereof
| March 16, 2005 |
| 7175944 | Prevention of photoresist scumming
| August 31, 2004 |
| 7175943 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
| December 3, 2003 |
| 7175942 | Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks
| February 5, 2004 |
| 7175941 | Phase shift assignments for alternate PSM
| September 8, 2003 |
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