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Your search returned 993 patents.
( 430/314 in Current US Classification ) |
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| Patent ID | Title | Date Filed |
| 6849389 | Method to prevent pattern collapse in features etched in sulfur dioxide-containing plasmas
| July 12, 2001 |
| 6849387 | Method for integrating copper process and MIM capacitor for embedded DRAM
| February 21, 2002 |
| 6841341 | Method of depositing an amorphous carbon layer
| December 17, 2002 |
| 6833326 | Method for forming fine patterns in semiconductor device
| January 8, 2003 |
| 6833232 | Micro-pattern forming method for semiconductor device
| January 8, 2003 |
| 6830877 | Method for forming via and contact holes with deep UV photoresist
| December 31, 2001 |
| 6821717 | Process to form narrow write track for magnetic recording
| August 2, 2002 |
| 6821715 | Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensors
| May 10, 2001 |
| 6821710 | Method of manufacturing semiconductor device
| April 19, 2000 |
| 6821706 | Polymerizable composition, polymer, resist, and process for electron beam lithography
| July 25, 2003 |
| 6808866 | Process for massively producing tape type flexible printed circuits
| May 1, 2002 |
| 6806037 | Method for producing and/or renewing an etching mask
| June 12, 2002 |
| 6806036 | Method for manufacturing a polysilicon type thin film transistor
| July 18, 2001 |
| 6801313 | Overlay mark, method of measuring overlay accuracy, method of making alignment and semiconductor device therewith
| July 27, 2000 |
| 6794119 | Method for fabricating a structure for a microelectromechanical systems (MEMS) device
| February 12, 2002 |
| 6787455 | Bi-layer photoresist method for forming high resolution semiconductor features
| December 21, 2001 |
| 6780570 | Method of fabricating a suspended micro-structure with a sloped support
| June 25, 2001 |
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