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| Patent ID | Title | Date Filed |
| 7183025 | Phase difference specifying method
| May 30, 2006 |
| 7182531 | Developing method and apparatus
| June 29, 2006 |
| 7180576 | Exposure with intensity balancing to mimic complex illuminator shape
| July 13, 2004 |
| 7179571 | Apparatus for characterization of photoresist resolution, and method of use
| February 9, 2006 |
| 7179568 | Defect inspection of extreme ultraviolet lithography masks and the like
| July 10, 2003 |
| 7175952 | Method of generating mask distortion data, exposure method and method of producing semiconductor device
| May 19, 2004 |
| 7175951 | Two mask in-situ overlay checking method
| April 19, 2002 |
| 7175945 | Focus masking structures, focus patterns and measurements thereof
| March 16, 2005 |
| 7175943 | Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
| December 3, 2003 |
| 7175940 | Method of two dimensional feature model calibration and optimization
| October 9, 2002 |
| 7172838 | Chromeless phase mask layout generation
| September 27, 2002 |
| 7170604 | Overlay metrology method and apparatus using more than one grating per measurement direction
| July 3, 2003 |
| 7170603 | Position detection apparatus and exposure apparatus
| June 30, 1999 |
| 7169515 | Phase conflict resolution for photolithographic masks
| April 29, 2004 |
| 7165233 | Test ket layout for precisely monitoring 3-foil lens aberration effects
| April 12, 2004 |
| 7164960 | Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device
| October 15, 2004 |
| 7161640 | Shield junction thin film transistor structure
| August 16, 2004 |
| 7160657 | Reference wafer and process for manufacturing same
| January 26, 2004 |
| 7160656 | Method for determining pattern misalignment over a substrate
| January 20, 2006 |
| 7160655 | Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
| May 16, 2005 |
| 7160654 | Method of the adjustable matching map system in lithography
| December 2, 2003 |
| 7160651 | Manufacturable chromeless alternating phase shift mask structure with phase grating
| October 17, 2003 |
| 7160650 | Method of inspecting a mask
| July 31, 2003 |
| 7159197 | Shape-based geometry engine to perform smoothing and other layout beautification operations
| December 31, 2001 |
| 7157194 | Method for exposing a substrate with a structure pattern which compensates for the optical proximity effect
| February 5, 2004 |
| 7154105 | Method of exposing using electron beam
| February 25, 2005 |
| 7153728 | Estimation of remaining film thickness distribution, correction of patterning and insulation film removing masks with remaining film thickness distribution, and production of semiconductor device with corrected patterning and insulation film removing mask | December 11, 2003 |
| 7153045 | Electro-mechanical system and method for mixing replenishment for plate precursor developers
| January 7, 2005 |
| 7150949 | Further method to pattern a substrate
| August 4, 2004 |
| 7148959 | Test pattern, inspection method, and device manufacturing method
| October 30, 2003 |
| 7147977 | Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device
| April 28, 2004 |
| 7147976 | Binary OPC for assist feature layout optimization
| October 17, 2005 |
| 7145634 | Lithographic apparatus and device manufacturing method
| December 1, 2004 |
| 7144663 | Method and apparatus for liquid preparation of photographic reagent
| February 11, 2004 |
| 7135259 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
| May 28, 2003 |
| 7132206 | Process and apparatus for minimizing thermal gradients across an advanced lithographic mask
| September 17, 2002 |
| 7122281 | Critical dimension control using full phase and trim masks
| November 14, 2002 |
| 7118834 | Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
| April 1, 2004 |
| 7116411 | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
| August 26, 2004 |
| 7116398 | Lithographic apparatus and device manufacturing method
| October 26, 2004 |
| 7115343 | Pliant SRAF for improved performance and manufacturability
| March 10, 2004 |
| 7113256 | Lithographic apparatus and device manufacturing method with feed-forward focus control
| February 18, 2004 |
| 7108946 | Method of lithographic image alignment for use with a dual mask exposure technique
| January 12, 2004 |
| 7103870 | Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI
| November 12, 2003 |
| 7102736 | Method of calibration, calibration substrate, and method of device manufacture
| June 29, 2004 |
| 7101646 | Developing method and apparatus
| September 20, 2005 |
| 7099010 | Two-dimensional structure for determining an overlay accuracy by means of scatterometry
| November 25, 2002 |
| 7098046 | Alignment method and exposure apparatus using the method
| March 17, 2004 |
| 7097946 | Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product
| July 9, 2003 |
| 7095481 | Exposure method and apparatus
| September 12, 2003 |
| 7092068 | Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device
| November 26, 2003 |
| 7090948 | Reflection mask and method for fabricating the reflection mask
| November 18, 2002 |
| 7087352 | Automated overlay metrology system
| November 12, 2003 |
| 7083881 | Photomasking
| October 13, 2004 |
| 7083879 | Phase conflict resolution for photolithographic masks
| August 17, 2001 |
| 7078133 | Photolithographic mask
| January 29, 2003 |
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