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| Patent ID | Title | Date Filed |
| 6130012 | Ion beam milling to generate custom reticles
| January 13, 1999 |
| 6123983 | Method and apparatus for monitoring plasma processing operations
| April 23, 1998 |
| 6077357 | Orientless wafer processing on an electrostatic chuck
| May 29, 1997 |
| 6039850 | Sputtering of lithium
| May 29, 1997 |
| 6036877 | Plasma reactor with heated source of a polymer-hardening precursor material
| May 13, 1996 |
| 6031229 | Automatic sequencing of FIB operations
| May 20, 1998 |
| 6007879 | Adjustable energy quantum thin film plasma processing system
| December 12, 1996 |
| 5956565 | Analysis apparatus and analysis methods for semiconductor devices
| November 14, 1996 |
| 5948217 | Method and apparatus for endpointing while milling an integrated circuit
| December 20, 1996 |
| 5879573 | Method for optimizing a gap for plasma processing
| August 12, 1997 |
| 5871658 | Optical emisson spectroscopy (OES) method for monitoring and controlling plasma etch process when forming patterned layers
| January 13, 1997 |
| 5861086 | Method and apparatus for sputter etch conditioning a ceramic body
| March 10, 1997 |
| 5807761 | Method for real-time in-situ monitoring of a trench formation process
| July 19, 1996 |
| 5738756 | Method and apparatus for detecting optimal endpoints in plasma etch processes
| June 30, 1995 |
| 5693179 | Contaminant reduction improvements for plasma etch chambers
| June 2, 1995 |
| 5690784 | Ion milling end point detection method and apparatus
| June 20, 1994 |
| 5662782 | Method and apparatus for adjusting a resonance frequency of piezoelectric elements
| February 24, 1995 |
| 5658423 | Monitoring and controlling plasma processes via optical emission using principal component analysis
| November 27, 1995 |
| 5630949 | Method and apparatus for fabricating a piezoelectric resonator to a resonant frequency
| June 1, 1995 |
| 5616921 | Self-masking FIB milling
| June 30, 1994 |
| 5589041 | Plasma sputter etching system with reduced particle contamination
| June 7, 1995 |
| 5584971 | Treatment apparatus control method
| July 1, 1994 |
| 5576629 | Plasma monitoring and control method and system
| October 24, 1994 |
| 5556549 | Power control and delivery in plasma processing equipment
| May 2, 1994 |
| 5552327 | Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
| August 26, 1994 |
| 5547642 | Light ozone asher, light ashing method, and manufacturing method of semiconductor device
| March 1, 1995 |
| 5464518 | Cylindrical magnetron shield structure
| September 19, 1994 |
| 5455061 | Nondestructive determination of plasma processing treatment characteristics
| December 23, 1994 |
| 5447614 | Method of processing a sample using a charged beam and reactive gases and system employing the same
| June 15, 1994 |
| 5438001 | Method and device for measuring variation in decomposition rate of special material gas
| January 31, 1994 |
| 5425839 | Method for rapidly etching material on a semiconductor device
| May 14, 1992 |
| 5407524 | End-point detection in plasma etching by monitoring radio frequency matching network
| August 13, 1993 |
| 5403433 | Method and apparatus for monitoring layer processing
| September 3, 1993 |
| 5387309 | Process for the measurement of the thickness and refractive index of a thin film on a substrate, and an apparatus for carrying out the process
| November 30, 1992 |
| 5382342 | Fabrication process for a gradient index x-ray lens
| January 14, 1993 |
| 5348614 | Process for dynamic control of the concentration of one or more reactants in a plasma-enhanced process for formation of integrated circuit structures
| June 22, 1993 |
| 5347460 | Method and system employing optical emission spectroscopy for monitoring and controlling semiconductor fabrication
| August 25, 1992 |
| 5339039 | Langmuir probe system for radio frequency excited plasma processing system
| September 29, 1992 |
| 5326975 | Measurement of gas leaks into gas lines of a plasma reactor
| June 15, 1993 |
| 5320704 | Plasma etching apparatus
| November 27, 1991 |
| 5314603 | Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber
| July 24, 1992 |
| 5308414 | Method and apparatus for optical emission end point detection in plasma etching processes
| December 23, 1992 |
| 5288367 | End-point detection
| February 1, 1993 |
| 5277747 | Extraction of spatially varying dielectric function from ellipsometric data
| September 15, 1992 |
| 5273935 | Method of controlling etching with a focused charged beam by detecting electrical current or secondary electrons
| March 29, 1990 |
| 5242561 | Plasma processing method and plasma processing apparatus
| August 14, 1991 |
| 5242532 | Dual mode plasma etching system and method of plasma endpoint detection
| March 20, 1992 |
| 5236556 | Plasma apparatus
| July 19, 1991 |
| 5232537 | Dry etching apparatus
| October 11, 1991 |
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