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Your search returned 146 patents.
( 156/345.46 in Current US Classification ) |
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| Patent ID | Title | Date Filed |
| 6030486 | Magnetically confined plasma reactor for processing a semiconductor wafer
| December 16, 1996 |
| 6022446 | Shallow magnetic fields for generating circulating electrons to enhance plasma processing
| August 21, 1995 |
| 6015476 | Plasma reactor magnet with independently controllable parallel axial current-carrying elements
| February 5, 1998 |
| 6014943 | Plasma process device
| September 11, 1997 |
| 6000360 | Plasma processing apparatus
| July 2, 1997 |
| 5993598 | Magnetron
| July 22, 1997 |
| 5980687 | Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field
| April 27, 1998 |
| 5958141 | Dry etching device
| September 11, 1997 |
| 5951773 | Inductively coupled plasma chemical vapor deposition apparatus
| March 18, 1997 |
| 5944942 | Varying multipole plasma source
| March 4, 1998 |
| 5895551 | Plasma etching apparatus
| April 25, 1997 |
| 5888338 | Magnetron plasma processing apparatus and processing method
| March 27, 1997 |
| 5880034 | Reduction of semiconductor structure damage during reactive ion etching
| April 29, 1997 |
| 5795452 | Dry process system
| January 11, 1996 |
| 5733405 | Plasma processing apparatus
| February 6, 1996 |
| 5728278 | Plasma processing apparatus
| November 14, 1994 |
| 5718795 | Radial magnetic field enhancement for plasma processing
| August 21, 1995 |
| 5717294 | Plasma process apparatus
| February 27, 1995 |
| 5695597 | Plasma reaction apparatus
| August 17, 1995 |
| 5660671 | Magnetron plasma processing apparatus and processing method
| June 28, 1994 |
| 5627435 | Hollow cathode array and method of cleaning sheet stock therewith
| February 15, 1996 |
| 5607542 | Inductively enhanced reactive ion etching
| November 1, 1994 |
| 5605576 | High frequency magnetron plasma apparatus
| November 9, 1994 |
| 5534108 | Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor
| March 7, 1995 |
| 5531862 | Method of and apparatus for removing foreign particles
| July 19, 1994 |
| 5527394 | Apparatus for plasma enhanced processing of substrates
| May 13, 1994 |
| 5505780 | High-density plasma-processing tool with toroidal magnetic field
| March 18, 1992 |
| 5484485 | Plasma reactor with magnet for protecting an electrostatic chuck from the plasma
| October 29, 1993 |
| 5474643 | Plasma processing apparatus
| December 20, 1993 |
| 5472508 | Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates
| January 14, 1993 |
| 5470426 | Plasma processing apparatus
| October 27, 1994 |
| 5457298 | Coldwall hollow-cathode plasma device for support of gas discharges
| July 27, 1993 |
| 5456796 | Control of particle generation within a reaction chamber
| June 2, 1993 |
| 5444207 | Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
| March 26, 1993 |
| 5435881 | Apparatus for producing planar plasma using varying magnetic poles
| March 17, 1994 |
| 5433786 | Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
| December 20, 1993 |
| 5431769 | Method and system for plasma treatment
| October 25, 1993 |
| 5415719 | Two parallel plate electrode type dry etching apparatus
| October 7, 1993 |
| 5411624 | Magnetron plasma processing apparatus
| December 27, 1993 |
| 5399253 | Plasma generating device
| November 16, 1993 |
| 5376211 | Magnetron plasma processing apparatus and processing method
| September 27, 1991 |
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