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Your search returned 35 patents.
( 148/DIG.137 in Current US Classification ) |
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| 1 |
| Patent ID | Title | Date Filed |
| 5173452 | Process for the vapor deposition of polysilanes photoresists
| January 2, 1991 |
| 5171718 | Method for forming a fine pattern by using a patterned resist layer
| January 9, 1991 |
| 5157003 | Method of etching isolation and alignment mark regions using a single resist mask
| November 27, 1991 |
| 5106786 | Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide
| October 23, 1989 |
| 5093283 | Method of manufacturing a semiconductor device
| May 16, 1991 |
| 5066616 | Method for improving photoresist on wafers by applying fluid layer of liquid solvent
| September 7, 1990 |
| 5066615 | Photolithographic processes using thin coatings of refractory metal silicon nitrides as antireflection layers
| August 6, 1990 |
| 5013689 | Method of forming a passivation film
| January 18, 1990 |
| 4997869 | Production of electronic coatings by spin coating a partially fluorinated polyimide composition
| October 11, 1988 |
| 4985374 | Making a semiconductor device with ammonia treatment of photoresist
| June 27, 1990 |
| 4980317 | Method of producing integrated semiconductor structures comprising field-effect transistors with channel lengths in the submicron range using a three-layer resist system
| March 21, 1989 |
| 4952528 | Photolithographic method for manufacturing semiconductor wiring patterns
| October 4, 1989 |
| 4900696 | Method for patterning photo resist film
| December 14, 1988 |
| 4845053 | Flame ashing process for stripping photoresist
| January 25, 1988 |
| 4803181 | Process for forming sub-micrometer patterns using silylation of resist side walls
| March 17, 1987 |
| 4771017 | Patterning process
| June 23, 1987 |
| 4767723 | Process for making self-aligning thin film transistors
| October 30, 1987 |
| 4748132 | Micro fabrication process for semiconductor structure using coherent electron beams
| December 15, 1986 |
| 4500628 | Process of making solid state devices using silicon containing organometallic plasma developed resists
| June 27, 1983 |
| 4311533 | Method of making self-aligned differently doped regions by controlled thermal flow of photoresist layer
| June 20, 1980 |
| 4253888 | Pretreatment of photoresist masking layers resulting in higher temperature device processing
| June 11, 1979 |
| 4231811 | Variable thickness self-aligned photoresist process
| September 13, 1979 |
| 4173063 | Fabrication of a semiconductor component element having a Schottky contact and little series resistance utilizing special masking in combination with ion implantation
| June 30, 1977 |
| 4038110 | Planarization of integrated circuit surfaces through selective photoresist masking
| June 14, 1976 |
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